Description
Benefits:
CSYLH+’s formula is designed to calm visible irritation and support skin recovery following aesthetic procedures. The mask’s soft, close-adhering sheet promotes the delivery of soothing and reparative ingredients, whilst maintaining comfort.
Supports post-procedure skin recovery and comfort
Helps reduce visible redness, dryness, and tightness
Provides intensive hydration to compromised skin
Supports barrier repair and skin resilience
Non-occlusive, lightweight essence suitable for sensitive skin
Ideal for in-clinic post-treatment application
35ml essence per mask
Key ingredients:
Dipropylene Glycol & Glycerin – support moisture retention and hydration balance
Propylene Glycol & Butylene Glycol – enhance skin penetration and ingredient delivery
Copper Tripeptide-8 – supports skin soothing and recovery whilst helping calm irritation
Palmitoyl Pentapeptide-4 – supports skin repair processes and barrier integrity
Edelweiss Extract – provides antioxidant protection and helps reinforce the skin barrier
Professional application:
- Cleanse the skin following completion of an aesthetic procedure
- Apply the mask evenly to the facial area
- Leave in place for 15-20 minutes
- Remove and gently press remaining essence into the skin
- Follow with appropriate post-procedure care products, including SPF 50, as required
Product disclaimer: If any adverse instances such as a rash, swelling or itchiness arise, cease usage. Do not apply to areas of broken skin or wounds.
Dipropylene Glycol, Glycerin, Propylene Glycol, Butylene Glycol, Copper Tripeptide-8, Palmitoyl Pentapeptide-4, Edelweiss Extract.
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For any injectable, microneedling and/or topical product: we advise that you conduct a patch test and wait in accordance with manufacturer advice (as per the product's packaging and/or enclosed literature) before proceeding to use it. You must agree not to use any products purchased on this website without taking appropriate measures and precautions against any potential harm that may arise. We assume no liability for the negative consequences of self-use.
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